Rita H. Lin, who is a founding partner of Lee & Lin IP, is an intellectual property law specialist, with a particular focus on patent matters. A significant portion of her practice is focused on representing startups and emerging growth companies, both domestic and international, in developing and implementing forward thinking patent strategies that would complement and empower her clients’ growth. Ms. Lin routinely counsels clients on patent prosecution, patent portfolio development and management, technology licensing, product development and clearance. She has represented clients litigating in various U.S. Federal Courts, as well as before the U.S. Patent and Trademark Office. Ms. Lin is licensed in NY and NJ, and is a registered patent attorney with the US Patent & Trademark Office.
Ms. Lin received her bachelor of science degree from MIT and her juris doctorate from Boston University School of Law.